What is resist material?

Resist materials are substances or coatings that can be used in various manufacturing processes to protect parts of a material from being subjected to certain treatments such as etching, plating or radiation exposure. The purpose of using a resist material is to create a pattern that can be transferred onto the material, often used in the manufacturing of electronic circuits, microchips, and photolithography processes.

There are many types of resist materials available, including photoresists, electron beam resists, and ion beam resists. Photoresists are the most commonly used type and are activated by exposure to light. They are typically composed of a polymer or photoactive compound.

Electron beam resists rely on a high-energy beam of electrons to create a pattern. These types of resists are used in electron beam lithography, a process used to create microcircuits in electronic devices.

Ion beam resists are also used in a similar manner to electron beam resists, but instead, use a beam of ions to create a pattern.

Other types of resist materials include atomic layer deposition resists, nanoimprint resists, and flowable oxide resist.

Resist materials are an essential component in the creation of micro- and nanotechnologies and play an essential role in the functionality of many advanced devices.